发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES
摘要 There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), R0 is a hydrogen atom or a methyl group; R1 is a single bond or a C1-5 alkylene group; R2 is a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), R0s are optionally different from each other).
申请公布号 US2013245152(A1) 申请公布日期 2013.09.19
申请号 US201113989185 申请日期 2011.11.21
申请人 SODA HIROYUKI;SAKAGUCHI TAKAHIRO;KISHIOKA TAKAHIRO;NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 SODA HIROYUKI;SAKAGUCHI TAKAHIRO;KISHIOKA TAKAHIRO
分类号 G02B1/04 主分类号 G02B1/04
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