| 发明名称 |
PHOTORESIST STRIPPING AND CLEANING COMPOSITION, METHOD OF ITS PREPARATION AND ITS USE |
| 摘要 |
A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol. |
| 申请公布号 |
WO2013136318(A1) |
申请公布日期 |
2013.09.19 |
| 申请号 |
WO2013IB52141 |
申请日期 |
2013.03.18 |
| 申请人 |
BASF SE;BASF (CHINA) COMPANY LIMITED |
发明人 |
BITTNER, CHRISTIAN;KLIPP, ANDREAS;BRAUN, SIMON |
| 分类号 |
G03F7/42;H01L21/02 |
主分类号 |
G03F7/42 |
| 代理机构 |
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