| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition that gives a resin film having high transparency and adhesiveness and excellent processability for an ITO electrode (processability when an ITO electrode is formed in a state of penetrating the resin film or formed on a surface of the resin film).SOLUTION: The negative photosensitive resin composition comprises: an epoxy group-containing acrylate resin (A) having an acid value of 30 to 100 mgKOH/g and a weight average molecular weight of 500 to 3,000; a polyfunctional acrylate compound (B) having four or more functional groups; a radical-generating photopolymerization initiator (C); an epoxy compound (D) having a weight average molecular weight of 200 to 550 and a glycidyl ether group; and a silane coupling agent (E) having an epoxy group. |
