发明名称 |
METHOD OF CONTROLLING A PATTERNING DEVICE IN A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS |
摘要 |
A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.
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申请公布号 |
US2013242277(A1) |
申请公布日期 |
2013.09.19 |
申请号 |
US201113885066 |
申请日期 |
2011.12.02 |
申请人 |
MULCKHUYSE WOUTER FRANS WILLEM;DE JAGER PIETER WILLEM HERMAN;VAN ZWET ERWIN JOHN;ASML NETHERLANDS B.V. |
发明人 |
MULCKHUYSE WOUTER FRANS WILLEM;DE JAGER PIETER WILLEM HERMAN;VAN ZWET ERWIN JOHN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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