| 摘要 |
<p>Controlling particles near a reticle of a lithography or reticle inspection system may include generating a curtain of ultraviolet light about a reticle protection area of a reticle by illuminating a region surrounding the reticle protection area with ultraviolet light having sufficient energy to induce a charge on one or more particles traversing the curtain of ultraviolet light, generating an electric field in a region positioned between the generated curtain of ultraviolet light and the reticle protection area, the electric field generated between a first charging element and a second charging element having an opposite charge to the first charging element, directing one or more charged particles to the first charging element or the second charging element using the generated electric field; and capturing the one or more charged particles on the first charging element or the second charging element.</p> |
