| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target which can achieve a high sputter rate and can form a TiOfilm having a high conductivity and a high light transmittance, and to provide a production method for the same.SOLUTION: A sputtering target of a titanium oxide comprises a sintered compact in which, in X-ray diffraction, peaks of TiOphase of a rutile crystal structure and of a titanium oxide phase of a magneli phase are observed, and which has an O/Ti atomic ratio in the range of 1.85-1.95. The observed maximum peak is the peak of the titanium oxide phase of the magneli phase, and the average particle size of the sintered compact is 2 μm or more. |
