发明名称 SEMICONDUCTOR ELEMENT AND METHOD OF MANUFACTURING SAME
摘要 A method of manufacturing a semiconductor element includes forming a first bonding layer containing a metal, which forms a eutectic crystal with Au, on a first substrate to provide a first laminated body. The method also includes forming an element structure layer having a semiconductor layer on a second substrate. The method also includes forming a second bonding layer on the element structure layer to provide a second laminated body. The second bonding layer has a metal underlayer containing a metal, which forms a eutectic crystal with Au. The second bonding layer also has a surface layer that contains Au. The method also includes performing heating pressure-bonding on the first and second laminated bodies with the first and second bonding layers facing each other. The heating temperature of the second substrate in the heating pressure-bonding is higher than the heating temperature of the first substrate.
申请公布号 US2013241061(A1) 申请公布日期 2013.09.19
申请号 US201313845078 申请日期 2013.03.17
申请人 STANLEY ELECTRIC CO., LTD. 发明人 CHINONE TAKAKO;MIYACHI MAMORU;SAITO TATSUMA;AKAGI TAKANOBU
分类号 H01L21/02;H01L29/45 主分类号 H01L21/02
代理机构 代理人
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