发明名称 |
NONVOLATILE MEMORY ELEMENT AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a nonvolatile memory element which reduces a break voltage and inhibits variations of break voltages between elements having nonvolatile memory characteristics.SOLUTION: A nonvolatile memory element 100 includes: a first electrode 106; a level difference formation layer 107 that is disposed covering a first region on a main surface of the first electrode 106; a resistance change layer 111 which is disposed covering a second region on the main surface of the first electrode 106 which is not covered by the level difference formation layer 107, a main surface of the level difference formation layer 107, and a level difference surface 116 connecting the second region with the main surface of the level difference formation layer 107; and a second electrode 110 disposed on the resistance change layer 111. The resistance change layer 111 has a first resistance change layer 108 and a second resistance change layer 109 which has a bending part 117 above the level difference surface 116. |
申请公布号 |
JP2013187503(A) |
申请公布日期 |
2013.09.19 |
申请号 |
JP20120053697 |
申请日期 |
2012.03.09 |
申请人 |
PANASONIC CORP |
发明人 |
MIYANAGA RYOKO;KAWASHIMA YOSHIO;MURASE HIDEAKI;MIKAWA TAKUMI |
分类号 |
H01L27/105;H01L45/00;H01L49/00 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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