发明名称 NONVOLATILE MEMORY ELEMENT AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory element which reduces a break voltage and inhibits variations of break voltages between elements having nonvolatile memory characteristics.SOLUTION: A nonvolatile memory element 100 includes: a first electrode 106; a level difference formation layer 107 that is disposed covering a first region on a main surface of the first electrode 106; a resistance change layer 111 which is disposed covering a second region on the main surface of the first electrode 106 which is not covered by the level difference formation layer 107, a main surface of the level difference formation layer 107, and a level difference surface 116 connecting the second region with the main surface of the level difference formation layer 107; and a second electrode 110 disposed on the resistance change layer 111. The resistance change layer 111 has a first resistance change layer 108 and a second resistance change layer 109 which has a bending part 117 above the level difference surface 116.
申请公布号 JP2013187503(A) 申请公布日期 2013.09.19
申请号 JP20120053697 申请日期 2012.03.09
申请人 PANASONIC CORP 发明人 MIYANAGA RYOKO;KAWASHIMA YOSHIO;MURASE HIDEAKI;MIKAWA TAKUMI
分类号 H01L27/105;H01L45/00;H01L49/00 主分类号 H01L27/105
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