发明名称 LASER SCRIBING WITH EXTENDED DEPTH AFFECTATION INTO A WORKPIECE
摘要 <p>Systems and methods for laser scribing provide extended depth affectation into a substrate or workpiece by focusing a laser beam such that the beam passes into the workpiece using a waveguide, self-focusing effect to cause internal crystal damage along a channel extending into the workpiece. Different optical effects may be used to facilitate the waveguide, self-focusing effect, such as multi-photon absorption in the material of the workpiece, transparency of the material of the workpiece, and aberrations of the focused laser. The laser beam may have a wavelength, pulse duration, and pulse energy, for example, to provide transmission through the material and multi-photon absorption in the material. An aberrated, focused laser beam may also be used to provide a longitudinal spherical aberration range sufficient to extend the effective depth of field (DOF) into the workpiece.</p>
申请公布号 WO2013138802(A1) 申请公布日期 2013.09.19
申请号 WO2013US32781 申请日期 2013.03.18
申请人 IPG MICROSYSTEMS LLC 发明人 SERCEL, JEFFREY, P.;MENDES, MARCO;HANNON, MATHEW;VON DADELSZEN, MICHAEL
分类号 B23K26/04 主分类号 B23K26/04
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