发明名称 TRANSPARENT OXIDE FILM, METHOD FOR MANUFACTURING THE SAME, AND OXIDE SPUTTERING TARGET
摘要 PROBLEM TO BE SOLVED: To provide a zinc oxide-based transparent oxide film with a low refractive index and an excellent gas barrier property, a method for manufacturing the same, and an oxide sputtering target.SOLUTION: A transparent oxide film is an oxide having a composition of, with respect to the total metal content, 3-13 at% Al, 21-59 at% Si, and 10-48 at% Mg, with the balance being Zn and inevitable impurities. The sputtering target used to manufacture the transparent oxide film consists of an oxide sintered compact having a composition of, with respect to the total metal content, 3-8 at% Al, 11-27 at% Si, and 5-18 at% Mg, with the balance being Zn and inevitable impurities.
申请公布号 JP2013185176(A) 申请公布日期 2013.09.19
申请号 JP20120049505 申请日期 2012.03.06
申请人 MITSUBISHI MATERIALS CORP 发明人 KONDO YUICHI;CHO SHUHIN
分类号 C23C14/08;C04B35/453 主分类号 C23C14/08
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