EXPOSURE APPARATUS, CLEANING TOOL, MAINTENANCE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing the occurrence of an exposure failure.SOLUTION: The exposure apparatus exposes a substrate to exposure light emitted from an emission surface of an optical member. The exposure apparatus includes a predetermined member and a suppression device which supplies an ionized gas to the predetermined member to suppress adhesion of foreign matter to the predetermined member.