发明名称 ETCHING AGENT FOR COPPER OR COPPER ALLOY
摘要 [Problem] The purpose of the present invention is to provide an etching agent for a process for etching copper or a copper alloy from an electronic substrate that includes both nickel, and copper or a copper alloy, wherein said etching agent foams little during use and can highly selectively etch copper or a copper alloy. [Solution] An etching agent used in a process for selectively etching copper or a copper alloy from an electronic substrate that includes both nickel, and copper or a copper alloy, said etching agent for copper or a copper alloy having as essential components: a chain-like alkanolamine (A); a chelating agent (B) having an acid group in the molecules thereof; and hydrogen peroxide (C).
申请公布号 WO2013076587(A3) 申请公布日期 2013.09.19
申请号 WO2012IB03029 申请日期 2012.09.28
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 KOJIMA, TSUTOMU;KOJI, YUKICHI
分类号 C23F1/18;C09K13/00 主分类号 C23F1/18
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