发明名称 |
ETCHING AGENT FOR COPPER OR COPPER ALLOY |
摘要 |
[Problem] The purpose of the present invention is to provide an etching agent for a process for etching copper or a copper alloy from an electronic substrate that includes both nickel, and copper or a copper alloy, wherein said etching agent foams little during use and can highly selectively etch copper or a copper alloy. [Solution] An etching agent used in a process for selectively etching copper or a copper alloy from an electronic substrate that includes both nickel, and copper or a copper alloy, said etching agent for copper or a copper alloy having as essential components: a chain-like alkanolamine (A); a chelating agent (B) having an acid group in the molecules thereof; and hydrogen peroxide (C). |
申请公布号 |
WO2013076587(A3) |
申请公布日期 |
2013.09.19 |
申请号 |
WO2012IB03029 |
申请日期 |
2012.09.28 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
KOJIMA, TSUTOMU;KOJI, YUKICHI |
分类号 |
C23F1/18;C09K13/00 |
主分类号 |
C23F1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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