BLOCK COPOLYMER-CONTAINING COMPOSITION AND METHOD FOR REDUCTION OF PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for reducing a pattern formed in a thin film on a substrate by use of formation of a phase-separation structure by a block copolymer.SOLUTION: A block copolymer-containing composition comprises: (A) a block copolymer having a Pblock and one or more kinds of blocks immiscible with the Pblock bonded therein, provided that the etching selection ratio of the one or more kinds of blocks to the Pblock is more than one; and (B) at least one polymer selected from a group consisting of random copolymers and homopolymers. The polymer of the component (B) is miscible with at least one of the blocks included in the block copolymer of the component (A) except the Pblock, and immiscible with the Pblock.