发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To inhibit variations in finish while using a surface active agent and prevent contamination caused by particles floating on a process liquid surface.SOLUTION: A control part 45 causes a process liquid to be supplied to an inner tank 3 and positions a substrate W at a process position to perform processing on the substrate W using the process liquid. The control part 45 causes a surface active agent to be dropped from a drop nozzle 35 to a process liquid surface when lifting a lifter 27 to a lift up position. Particles are drawn to a region having large surface tension due to surface diffusion action of the surface active agent to be discharged to the exterior. Subsequently, the substrate W is lifted up through the process liquid surface, where the particles are substantially removed, by lifting up the lifter 27 to the lift up position. Thus, the contamination of the substrate W due to the particles floating on the process liquid surface is prevented. Further, since the surface active agent is dropped only before the substrate W is lifted up, the surface active agent is not likely to affect the processing using the process liquid and variations in finish are reduced.
申请公布号 JP2013187401(A) 申请公布日期 2013.09.19
申请号 JP20120051880 申请日期 2012.03.08
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MIURA SANAE
分类号 H01L21/304 主分类号 H01L21/304
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