| 摘要 |
<P>PROBLEM TO BE SOLVED: To accurately detect positional information of a surface to be detected in normal line direction by reducing an influence of a pattern or a reflectance distribution of the surface to be detected. <P>SOLUTION: An apparatus for irradiating measuring light L1 to a reticle surface Ra to receive the reflected light L2 from the reticle surface Ra by a photoelectric sensor 37, detecting surface position information of the reticle surface Ra includes: a confocal optical system including an objective lens 35 for receiving the reflected light L2 by irradiating the measuring light L1 to the reticle surface Ra and a pinhole plate 36 for passing the reflected light L2 through the objective lens 35 to the photoelectric sensor 37; and a phase plate 33 for imparting a phase distribution so as to widen an irradiation area of the measuring light L1 on the reticle surface Ra and so as to narrow the irradiation area of the reflected light L2 on the pinhole plate 36. <P>COPYRIGHT: (C)2010,JPO&INPIT |
