| 摘要 |
PROBLEM TO BE SOLVED: To precipitate vanadium or a vanadium alloy on a base material in an arbitrary shape as a hydrogen separating and refining film material using a chemical vapor deposition (CVD) method. SOLUTION: This hydrogen permeable film manufacturing apparatus is composed of a first reaction vessel 1, the second reaction vessel 2 arranged in the first reaction vessel 1 and partitioned from the first reaction vessel 1 at its opening part by a porous substrate 3, an raw material gas supply means 4 for supplying a vanadium raw material 9 into the first reaction vessel 1 by a carrier gas 10, a first exhaust means 5 for exhausting the pas in the first reaction vessel 1 and a second exhaust means 6 for exhausting the gas in the second reaction container 2. The exhaust force of the second exhaust means 6 is made higher than that of the first exhaust means 5 and vanadium is deposited on the surface of the porous substrate 3 and/or in the porous substrate 3 by the chemical vapor phase deposition method. COPYRIGHT: (C)2008,JPO&INPIT
|
