发明名称
摘要 <p>The invention relates to a vacuum arc vaporisation source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporisation material (31) as a cathode (32) for the production of an arc discharge on an vaporisation surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporisation surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporisation surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporisation surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporisation chamber (10) with an arc vaporisation source (1).</p>
申请公布号 JP5291086(B2) 申请公布日期 2013.09.18
申请号 JP20100503437 申请日期 2008.03.11
申请人 发明人
分类号 C23C14/24;H05H1/48 主分类号 C23C14/24
代理机构 代理人
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