发明名称 |
Modified novolak phenolic resin, making method, and resist composition |
摘要 |
<p>A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt% of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt% of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.</p> |
申请公布号 |
EP2586806(A3) |
申请公布日期 |
2013.09.18 |
申请号 |
EP20120189273 |
申请日期 |
2012.10.19 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HIRANO, YOSHINORI;YANAGISAWA, HIDEYOSHI |
分类号 |
C08G8/00;C08L61/00;C08L61/04;C08L61/20;G03F7/00;H01B3/00;H05B33/00;H05K1/00 |
主分类号 |
C08G8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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