| 发明名称 |
Method for clearing native oxide |
| 摘要 |
A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.
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| 申请公布号 |
US8536060(B2) |
申请公布日期 |
2013.09.17 |
| 申请号 |
US201213468042 |
申请日期 |
2012.05.10 |
| 申请人 |
CHEN YEN-CHU;TSAI TENG-CHUN;HUANG CHIEN-CHUNG;LIU KENG-JEN;UNITED MICROELECTRONICS CORP. |
发明人 |
CHEN YEN-CHU;TSAI TENG-CHUN;HUANG CHIEN-CHUNG;LIU KENG-JEN |
| 分类号 |
H01L21/302;C23F1/00 |
主分类号 |
H01L21/302 |
| 代理机构 |
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