| 摘要 |
PURPOSE: A wafer handler used for growing an epitaxial layer is provided to remove foreign materials from a susceptor by adding a cleaning device. CONSTITUTION: A handler arm(111) is combined with a robot and rotates. A gripper(120) is combined with the end of the handler arm and grips a wafer. A controller(130) controls a chamber, the robot, and an image device. A duct is combined with the end of a cleaning arm. A cleaner includes a roller combined with the inner side of the duct and an inhalation pipe which inhales air from the duct. |
