发明名称 USING BEAM BLOCKERS TO PERFORM A PATTERNED IMPLANT OF A WORKPIECE
摘要 Blockers in an ion beam blocker unit selectively block or trim an ion beam. In one instance, the ion beam has first current regions and second current regions. These current regions may be unequal. The ion beam is then implanted into a workpiece to form regions with different doses. The workpiece may be scanned so that the entirety of its surface is implanted.
申请公布号 KR20130102575(A) 申请公布日期 2013.09.17
申请号 KR20137008360 申请日期 2011.09.01
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 DISTASO DANIEL;LOW RUSSELL J.
分类号 H01J37/317;H01J37/302 主分类号 H01J37/317
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