发明名称 |
GAN-BASED SEMICONDUCTOR LIGHT EMITTING DIODE INCLUDING NANOPOROUS AND FABRICATING METHOD FOR THE SAME |
摘要 |
PURPOSE: A GaN-based semiconductor light emitting diode including nanopores and a method for fabricating the same are provided to improve light emission by using a wet etching process. CONSTITUTION: A GaN-based semiconductor layer(20) is formed on a substrate(50). An ITO layer(10) is laminated on the GaN-based semiconductor layer. A nanoporous is formed in the ITO layer. A groove is formed in the surface of the ITO layer by using a wet etching process. An electrode pad is formed in the GaN-based semiconductor layer. |
申请公布号 |
KR101309653(B1) |
申请公布日期 |
2013.09.17 |
申请号 |
KR20110111121 |
申请日期 |
2011.10.28 |
申请人 |
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发明人 |
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分类号 |
H01L33/36;H01L33/38;H01L33/42 |
主分类号 |
H01L33/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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