发明名称 GAN-BASED SEMICONDUCTOR LIGHT EMITTING DIODE INCLUDING NANOPOROUS AND FABRICATING METHOD FOR THE SAME
摘要 PURPOSE: A GaN-based semiconductor light emitting diode including nanopores and a method for fabricating the same are provided to improve light emission by using a wet etching process. CONSTITUTION: A GaN-based semiconductor layer(20) is formed on a substrate(50). An ITO layer(10) is laminated on the GaN-based semiconductor layer. A nanoporous is formed in the ITO layer. A groove is formed in the surface of the ITO layer by using a wet etching process. An electrode pad is formed in the GaN-based semiconductor layer.
申请公布号 KR101309653(B1) 申请公布日期 2013.09.17
申请号 KR20110111121 申请日期 2011.10.28
申请人 发明人
分类号 H01L33/36;H01L33/38;H01L33/42 主分类号 H01L33/36
代理机构 代理人
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