| 摘要 |
PURPOSE: A pattern transcription method, a manufacturing method of a flat panel display, and a manufacturing method of the photomask are provided to use a photomask including a minute or high precision transcription pattern. CONSTITUTION: A pattern transcription method comprises a step of preparing a photomask with a transcription pattern, and a step of transcribing the transcription pattern on a transcribing object using an exposure device. The transcription pattern includes a light-transmitting part obtained by patterning upper and lower layers formed on a transparent substrate (10), a light shielding part, and a semi light-transmitting part. The light-transmitting part is formed by exposing the transparent substrate. The light shielding part is formed by laminating the upper layer (30) on the lower layer (20). The semi light-transmitting part is formed by forming the lower layer on the transparent substrate. [Reference numerals] (A) Painting; (AA) Side etching; (B) Developing; (C) Upper layer preliminary etching; (D) Lower layer patterning; (E) Upper layer patterning; (F) Register pattern removing |
