WASHING SOLUTION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE, AND METHOD FOR WASHING SUBSTRATE FOR SEMICONDUCTOR DEVICE

摘要

The invention relates to a cleaning liquid for semiconductor device substrates comprising the following components (A) to (D) and a method of cleaning semiconductor device substrates: (A) at least either one of a polycarboxylic acid and a hydroxycarboxylic acid; (B) a sulfonic acid type anionic surfactant; (C) a carboxylic acid type anionic surfactant; and (D) water.