发明名称 |
System and method for approximating a diffusion profile utilizing gathered lighting information associated with an occluded portion of an object |
摘要 |
A system and method are provided for approximating a diffusion profile utilizing gathered lighting information associated with an occluded portion of an object. In use, the present technique gathers information associated with an occluded portion of an object that is illuminated with a two-dimensional pattern of light including an edge which defines an illuminated portion and the occluded portion of the object. To this end, a diffusion profile of the object is approximated, utilizing such information.
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申请公布号 |
US8538183(B1) |
申请公布日期 |
2013.09.17 |
申请号 |
US20070958219 |
申请日期 |
2007.12.17 |
申请人 |
D'EON EUGENE J.;LUEBKE DAVID PATRICK;NVIDIA CORPORATION |
发明人 |
D'EON EUGENE J.;LUEBKE DAVID PATRICK |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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