发明名称 Photoacid generator, chemically amplified resist composition including the same, and associated methods
摘要 A photoacid generator represented by Formula 1 or Formula 2: wherein R1, R2, and R3 are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S+, and at least one CH2 group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R5-S+A-, where R5 is a C1-C10 alkyl group, and A- is a counter-ion.
申请公布号 US8536347(B2) 申请公布日期 2013.09.17
申请号 US20080285047 申请日期 2008.09.29
申请人 KANG YOOL;KIM HAK-WON;KIM WEOUN-JU;CHOI SEONG-WOON;KIM HYUN-WOO;NA HAI-SUB;KIM KYOUNG-TAEK;SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG YOOL;KIM HAK-WON;KIM WEOUN-JU;CHOI SEONG-WOON;KIM HYUN-WOO;NA HAI-SUB;KIM KYOUNG-TAEK
分类号 C07D339/00;C07D335/00 主分类号 C07D339/00
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