| 摘要 |
PURPOSE: A substrate etching apparatus for automatically removing sludge is provided to remove sludge included in an etchant solution and to prevent process error and facility malfunction. CONSTITUTION: A pump(300) supplies an etching solution for a substrate etching process to an etching solution supply pipe(440). A nozzle formed in a bath sprays the etching solution. The sludge included in the etchant solution is removed using a filtering plate(414) formed in a chamber(412). The sludge is gathered in the chamber. After the filtering plate is removed, the sludge is discharged to the outside through a drain pipe(420) by using deionized water supplied by a deionized water supply unit(430). |
