| 摘要 |
The invention provides a substrate processing device and a vacuum intake device, wherein the weight of the vacuum intake device is largely lightened without increasing the internal volume thereof. The vacuum intake device (200) comprises a substrate storing chamber (202, 204) and a carrier carrying platform (220) arranged inside the substrate storing chamber for temporarily carrying the stored substrate. The internal pressure of the substrate storing chamber can be switched into a pressure reduction environment or an atmospheric pressure environment. The buffer carrying platform is equipped with one or more buffer components (222). The airtightness is realized by the buffer components, which are hollow. |
