发明名称 |
Method of growing electrical conductors |
摘要 |
A method for forming a conductive thin film includes depositing a metal oxide thin film on a substrate by an atomic layer deposition (ALD) process. The method further includes at least partially reducing the metal oxide thin film by exposing the metal oxide thin film to a reducing agent, thereby forming a seed layer. In one arrangement, the reducing agent comprises one or more organic compounds that contain at least one functional group selected from the group consisting of -OH, -CHO, and -COOH. In another arrangement, the reducing agent comprises an electric current.
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申请公布号 |
US8536058(B2) |
申请公布日期 |
2013.09.17 |
申请号 |
US201113153229 |
申请日期 |
2011.06.03 |
申请人 |
KOSTAMO JUHANA;SOININEN PEKKA J.;ELERS KAI-ERIK;HAUKKA SUVI;ASM INTERNATIONAL N.V. |
发明人 |
KOSTAMO JUHANA;SOININEN PEKKA J.;ELERS KAI-ERIK;HAUKKA SUVI |
分类号 |
H01L21/44;H01L21/00;H01L21/285;H01L21/3105;H01L21/768 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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