| 摘要 |
A light-shielding portion is formed by laminating a light semi-transmitting film, a phase-shift adjusting film, and a light-shielding film on a transparent substrate in this order. A light semi-transmitting portion is obtained by forming the light semi-transmitting film on the transparent substrate. A light transmitting portion is obtained by exposing the transparent substrate. At a boundary between the light-shielding portion and the light transmitting portion, a phase shifter portion is formed by partially exposing the phase-shift adjusting film on the light semi-transmitting film. A difference between a phase-shift amount when exposure light passes through the phase shifter portion and a phase-shift amount when the exposure light passes through the light transmitting portion is not smaller than 90 degrees and not greater than 270 degrees. |
