| 摘要 |
PURPOSE: A plasma source for uniform plasma density and a plasma chamber using the same are provided to secure the uniformity of DC by precisely controlling the plasma density. CONSTITUTION: A plasma source(100) includes an upper electrode plate(112) arranged on the upper part. The upper electrode plate is in the shape of a circle having a larger area than the area of a wafer. The upper part of the upper electrode plate is connected to a first RF source and a second RF source. Multiple unit coils(120) are arranged on the lower side of a vertical rod. The unit coil includes a first coil(121), a second coil(122), and a third coil(123). The unit coil is extended from the lower side of the vertical rod. |
