| 摘要 |
PROBLEM TO BE SOLVED: To improve deposition accuracy and reproducibility by improving positioning accuracy of a constituent member in a deposition apparatus of an oriented film.SOLUTION: A deposition apparatus includes an evaporation source, a substrate holder which holds a substrate arranged opposite to the evaporation source, and a carrying mechanism which carries an evaporation material to the evaporation source in a vacuum chamber, wherein the carrying mechanism includes a transfer mechanism which transfers the evaporation material and a positioning mechanism which determines a holding position of the evaporation material in the transfer mechanism. The transfer mechanism loads the evaporation material at a storage position, transfers the same to an adjustment stage of the positioning mechanism, and unloads the same in the first operation, and loads the evaporation material from the adjustment stage, transfers the same to a delivery position of the evaporation source, and unloads the same in the second operation. The positioning mechanism corrects the position of the evaporation material which is placed on the adjustment stage to a predetermined position between the first operation and the second operation. It is structured so that the distance between the adjustment stage and the delivery position is shorter than the distance between the storage position and the delivery position. |
