| 摘要 |
An exposure apparatus includes a first mark-forming unit further upstream than an irradiation region for exposure light in a direction of conveyance of a member to be exposed. A mark for meandering detection is detected, and a detection unit detects the mark for meandering detection in a direction intersecting a direction of movement of the member to be exposed. A second mark-forming unit is moved so as to negate an amount of meandering by the member to be exposed, computed on the basis thereof, and an alignment mark is formed rectilinearly in a relative fashion with respect to the member to be exposed. This enables highly accurate, stable exposure whereby, even in a case where the member is supplied continuously, an alignment mark for mask position adjustment can be changed in accordance with the meandering of the member to be exposed and the position of the mask with respect to the member to be exposed can be accurately adjusted.
|
