| 发明名称 |
MAINTENANCE METHOD, MAINTENANCE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.
|
| 申请公布号 |
US2013235359(A1) |
申请公布日期 |
2013.09.12 |
| 申请号 |
US201313871452 |
申请日期 |
2013.04.26 |
| 申请人 |
NIKON CORPORATION |
发明人 |
FUJIWARA TOMOHARU;NISHII YASUFUMI;SHIRAISHI KENICHI |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
