发明名称 PANTOGRAPH MEASURING METHOD AND PANTOGRAPH MEASURING INSTRUMENT
摘要 PROBLEM TO BE SOLVED: To provide a pantograph measuring method for preventing two erroneous recognitions of a real maker and a marker subjected to mirror reflection at a structure when the structure having mirror glossiness passes through on the marker.SOLUTION: In a pantograph measuring method by image processing comprising a procedure for acquiring a video image of a marker 50 installed on a pantograph 40 to generate a space-time image from the acquired video image, and a procedure for searching the marker 50 by collating the time-space image with a search pattern corresponding to height, the marker 50 has a stipe pattern obtained by alternately arranging a first region that hardly reflects light and a second region that easily reflects the light, at least two or more stipe widths are respectively different in the second region, and the search pattern corresponds to the stripe pattern of the marker 50.
申请公布号 JP2013181755(A) 申请公布日期 2013.09.12
申请号 JP20120043496 申请日期 2012.02.29
申请人 MEIDENSHA CORP 发明人
分类号 G01B11/02;B60L5/24;G01B11/00 主分类号 G01B11/02
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