发明名称 |
Liquid flow control for film deposition |
摘要 |
An apparatus for controlling liquid flow wherein the apparatus comprises an orifice and an adjacent flexible diaphragm separated from each other by a gap through which a liquid flows. The diaphragm is sufficiently flexible to vary the gap thereby controlling the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid flowing through the orifice. A method for controlling liquid flow through the apparatus comprises flexing said diaphragm to vary a size of the gap to control the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid from flowing through the orifice.
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申请公布号 |
US2013233395(A1) |
申请公布日期 |
2013.09.12 |
申请号 |
US201313785819 |
申请日期 |
2013.03.05 |
申请人 |
DINH THUC M.;LIU BENJAMIN Y.H.;MA YAMIN |
发明人 |
DINH THUC M.;LIU BENJAMIN Y.H.;MA YAMIN |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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