| 发明名称 |
SPLIT PUMPING METHOD, APPARATUS, AND SYSTEM |
| 摘要 |
A split-pumping system and method for semiconductor fabrication process chambers is provided. The split pumping method may provide two separate exhaust paths, each configured to evacuate a different process gas. The exhaust paths may be configured to not evacuate process gases other than the process gas that the exhaust path is configured to evacuate.
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| 申请公布号 |
US2013237063(A1) |
申请公布日期 |
2013.09.12 |
| 申请号 |
US201313783059 |
申请日期 |
2013.03.01 |
| 申请人 |
VARADARAJAN SESHASAYEE;XAVIER ANTONIO;CHANDRASEKHARAN RAMESH;RUDOLPH DIRK |
发明人 |
VARADARAJAN SESHASAYEE;XAVIER ANTONIO;CHANDRASEKHARAN RAMESH;RUDOLPH DIRK |
| 分类号 |
H01L21/67;H01L21/02 |
主分类号 |
H01L21/67 |
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