| 摘要 |
A defect inspection method according to the present invention is a defect inspection method for inspecting a defect of a semiconductor wafer, including the steps of: (a) forming a mark on a semiconductor wafer that is an inspection object, the mark corresponding to the size of a device chip that will be obtained from the semiconductor wafer, the mark being formed with respect to a predetermined device chip on the semiconductor wafer; and (b) during a predetermined process included in a semiconductor wafer process or before the semiconductor wafer process, performing a defect inspection on the semiconductor wafer and recognizing defect information based on the mark as a reference. |
