发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a structure and manufacturing method of an element in which speed of switching between a high resistance state and a low resistance state is improved, deterioration of the element due to the oxidation of an electrode is prevented, and variations between elements is reduced.SOLUTION: In a nonvolatile semiconductor storage device, a specific metal (e.g. Pt) is deposited on one surface of a perovskite oxide, heat treatment is performed under a hydrogen atmosphere so as to introduce hydrogen ion to the perovskite oxide by using hydrogen catalysis of the metal, a hydrogen reduction layer (a high resistance layer) is formed in an adjacent area being in contact with the metal of the perovskite oxide, and a hysteresis characteristic in a current-voltage characteristic between an electrode composed of the metal and another electrode (e.g. Au) paired through the oxide reduction layer is utilized.
申请公布号 JP2013183040(A) 申请公布日期 2013.09.12
申请号 JP20120046162 申请日期 2012.03.02
申请人 TOTTORI UNIV 发明人 KINOSHITA KENTARO;HANADA AKIHIRO;MATSUBARA KATSUHIKO;KISHIDA SATORU
分类号 H01L27/105;H01L45/00;H01L49/00 主分类号 H01L27/105
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