| 摘要 |
<p>A method for manufacturing an array substrate comprises the following steps: S1, a pattern including semiconductor layer (2), gate insulating layer (4), gate electrode (5) and gate line is formed on the substrate (1); S2, on the substrate (1) after step S1, a metal diffusion layer (3) is formed on the pattern of semiconductor layer (2) which is not covered by the gate insulating layer (4) and a barrier layer (6) is formed on other areas of the substrate (1); S3, a passivation layer (7) is formed on the substrate (1) after step S2; and S4, the pattern of a through hole (11), source electrode (81), drain electrode (82), data line and pixel electrode(9) is formed on the passivation layer (7), wherein the source electrode (81) and drain electrode (82) are connected with the metal diffusion layer (3) through the through holes (11). The method simply the processes and reduce the cost.</p> |
