发明名称 SUBSTRATE HOLDER ARRANGEMENT, COATING SYSTEM WITH SUBSTRATE HOLDER ARRANGEMENT AND METHOD FOR PERFORMING A COATING PROCESS
摘要 Disclosed is a substrate holder arrangement (10, 11) for a coating system (12), having a holder (1) which comprises at least one support zone (3) with a support surface (30) on which a substrate support (2) is arranged, which support further comprises at least one first and one second gas inlet (4, 5) in the support surface (30), the first gas inlet (4) having a smaller distance to the centre (M) of the support surface (30) than the second gas inlet (5), and the first and second gas inlets (4, 5) having mutually-independent gas feeds (40, 50) designed to feed gases of different thermal conductivity. A coating system comprising a substrate holder arrangement, and a method for performing a coating process are also disclosed.
申请公布号 WO2013131748(A1) 申请公布日期 2013.09.12
申请号 WO2013EP53369 申请日期 2013.02.20
申请人 OSRAM OPTO SEMICONDUCTORS GMBH 发明人 BAUER, THOMAS
分类号 H01L21/67 主分类号 H01L21/67
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