发明名称 THYRISTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an ESD protection element which is suitable for technology such as high speed bipolar process technology.SOLUTION: A thyristor includes: a first conductive type semiconductor substrate 100 forming a collector of a first bipolar transistor PNP1; a second conductive type first semiconductor layer 101 that is formed on the semiconductor substrate 100 and is used as a base of the first bipolar transistor PNP1 and a collector of the second bipolar transistor NPN1; a first conductive type second semiconductor layer 102 formed on the semiconductor substrate 100 so as to be arranged in parallel with the first semiconductor layer 101; and a first conductive type third semiconductor layer 103 formed on the first and second semiconductor layers 101, 102 and forming a base of the second bipolar transistor. The semiconductor substrate 100 is connected with the third semiconductor layer 103 by the second semiconductor layer 102.
申请公布号 JP2013183035(A) 申请公布日期 2013.09.12
申请号 JP20120046066 申请日期 2012.03.02
申请人 RENESAS ELECTRONICS CORP 发明人 WATANABE DAISUKE
分类号 H01L29/74;H01L21/331;H01L21/822;H01L21/8228;H01L27/04;H01L27/06;H01L27/082;H01L29/06;H01L29/737 主分类号 H01L29/74
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