发明名称 SILICON NITRIDE CIRCUIT SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a silicon nitride circuit substrate which is improved in joint strength and thermal cycle resistance by improving a state of a junction interface between a ceramic substrate and a brazing material, and also a method for manufacturing the same.SOLUTION: A silicon nitride circuit substrate is formed by jointing a silicon nitride substrate containing magnesium of 0.6 to 7.0 wt.% in terms of magnesium oxide (MgO), a group 3a element (3A) in the periodic table in a total amount of 0.7 to 8.0 wt% with the magnesium oxide in terms of an oxide (3AxOy), and a MgO/3AxOy having a weight ratio in the range of 1 to 70, and a metal circuit plate made of Al or A1 alloy through an Al-Si-based brazing material whose content of Si is 7 wt.% to 20 wt.% and content of Mg is 0.05 wt.% or less. On the junction interface between the silicon nitride substrate and the brazing material, a reaction generation layer is formed which is composed of at least two layers and whose thickness is 10 nm to 500 nm.
申请公布号 JP2013182960(A) 申请公布日期 2013.09.12
申请号 JP20120044782 申请日期 2012.02.29
申请人 HITACHI METALS LTD 发明人 IMAMURA TOSHIYUKI
分类号 H05K3/38;B23K1/00;B23K1/19;B23K101/42;B32B9/00;C04B35/584;C04B37/02;H05K1/03;H05K1/09;H05K3/00 主分类号 H05K3/38
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