发明名称 SnNb SPUTTERING TARGET
摘要 PROBLEM TO BE SOLVED: To improve bond strength between an SnNb target material and a backing plate.SOLUTION: An Ni layer 3 having thickness of 5 μm to 30 μm and a Cu layer 4 having thickness of 5 μm to 30 μm are laminated on a surface of an SnNb target material 2 in this order, and the Cu layer 4 and a backing plate 5 are bonded by solder 6 including In or In alloy in a portion therebetween. The Ni layer 3 and the Cu layer 4 on the surface of the SnNb target material 2 are formed by ion plating.
申请公布号 JP2013181214(A) 申请公布日期 2013.09.12
申请号 JP20120045899 申请日期 2012.03.01
申请人 MITSUBISHI MATERIALS CORP 发明人 JOHO MASANORI
分类号 C23C14/34;B23K1/00;B23K1/19;B23K1/20;B23K35/26;B23K103/08;B23K103/18;C22C13/00;C22C28/00;G11B7/24035;G11B7/26 主分类号 C23C14/34
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