发明名称 NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 According to one embodiment, a non-volatile semiconductor memory device includes: a semiconductor substrate; a plurality of first lines; a plurality of second lines; and a plurality of non-volatile memory cells arranged at positions where the plurality of first lines intersect with the plurality of second lines, wherein each of the plurality of non-volatile memory cells includes a resistance change element and a rectifying element connected in series to the resistance change element, and a resistance change film continuously extending over the plurality of second lines is arranged between the plurality of first lines and the plurality of second lines, and the resistance change element includes a portion where the first line intersect with the second line in the resistance change film.
申请公布号 US2013237029(A1) 申请公布日期 2013.09.12
申请号 US201313868440 申请日期 2013.04.23
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NANSEI HIROYUKI
分类号 H01L45/00 主分类号 H01L45/00
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