| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and processing method that use a spiral resonator with which a reflection wave is suppressed.SOLUTION: A plasma processing apparatus includes: a processing chamber that is arranged in a vacuum vessel, which can be decompressed, and in whose inside space plasma for processing a specimen that is a processing target arranged in the inside space is formed; means for supplying gas for plasma generation into the processing chamber; vacuum evacuation means for exhausting the inside of the processing chamber; a spiral resonance device composed of a spiral resonance coil installed outside the vacuum vessel and a shield arranged outside the resonance coil and electrically grounded; and a high frequency power source whose frequency is variable and which supplies high frequency power in a prescribed range to the resonance coil, wherein an electrical length of the resonance coil is set at an integral multiple of one wavelength at a prescribed frequency, a frequency matching device is included which is capable of adjusting the frequency of the high frequency power source so that reflection power of high frequency becomes the minimum, and a feeding point of the spiral resonance coil is connected to a ground potential using a variable capacitance element. |
