EXPOSURE APPARATUS FOR LASER DIRECT IMAGING

摘要

PURPOSE: A laser direct imaging exposure apparatus is provided to rapidly form a micro-pattern regardless of the focus depth by the planarity of a processing material. CONSTITUTION: A laser direct imaging exposure apparatus comprises the following: a femto-second laser generating unit (10) generating femto-second laser causing the multiphoton absorption; a light concentration lens in which the light focus is formed on a multiphoton absorbing polymer located on a stage by concentrating the femto-second laser (15) generated from the femto-second laser generating unit; an optical path control unit (20) located on an optical path of the femto-second laser generating unit and the light concentration lens, and vibrating the light focus to the thickness direction of the multiphoton absorbing polymer; and a control unit (60) controlling the output and the exposure time of the femto-second laser, and the vibration amplitude and cycle using the optical path control unit. [Reference numerals] (10) Femto-second laser generating unit; (60) Control unit