| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a magnetic disk substrate reducing surface roughness and scratches without impairing productivity, and to provide a manufacturing method for a magnetic disk substrate using the polishing liquid composition for the magnetic disk substrate. <P>SOLUTION: The polishing liquid composition for the magnetic disk substrate contains silica particles, at least one selected from a group consisting of a polymer having an ionic hydrophilic group and weight-average molecular weight less than 100,000, cumene sulfonate and salt thereof, and water. A graph for the particle diameter (R(nm)) of the silica particle versus a cumulative volume frequency (V(%)) satisfies formula (1): V≥R+30 in 40-70 nm particle diameter, formula (2): V≤3×R+10 in 10-20 nm particle diameter, and formula (3): V≥R+50 in 40-45 nm particle diameter. The mean value of a value obtained by dividing the area of a circle with the maximum diameter of the silica particle as a diameter by the projected area of the silica particle and multiplied by 100 falls in the range of 100-140. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
