| 摘要 |
An exposure apparatus configured to expose a substrate (P) through a projection optical system (PL) and a liquid immersion area (AR2) formed by a liquid supplied to an image plane side of the projection optical system, the exposure apparatus comprising a stage which has a substrate holding portion (PH1) adapted to hold the substrate, and which is movable with respect to the projection optical system on the image plane side of the projection optical system,
wherein the stage includes a recovery portion which is adapted to recover the liquid entered into a gap (A) between the substrate held by the substrate holding portion and an upper surface (Ta) of the stage provided outside the substrate holding portion, and
the recovery portion includes a porous member (68) or a mesh member, and includes a flow passage (65) which is adapted to recover the liquid entered into the gap and passed through the porous member or the mesh member. |
