发明名称 |
ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE SAME, AND PATTERN FORMING METHOD |
摘要 |
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification). |
申请公布号 |
KR101305067(B1) |
申请公布日期 |
2013.09.11 |
申请号 |
KR20120059666 |
申请日期 |
2012.06.04 |
申请人 |
|
发明人 |
|
分类号 |
G03F1/22;G03F7/00;G03F7/004 |
主分类号 |
G03F1/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|